Surface Physics M-Probe ESCA

X-ray Photoelectron Spectrometer (XPS)




X-ray Photoelectron Spectroscopy (XPS) is a surface sensitive quantitative analytical technique (3 - 10 nm analysis depth). It utilizes a monochromatic aluminum X-ray source and a hemispherical analyzer with microchannel plate detectors. The instrument is also equipped with an argon ion etching gun, flood gun, and quadrupole mass spectrometer for residual gas analysis. The analyzer has an optional aperture for angle resolved analysis, although the proper sample stage is not yet available for this analysis. Samples must be a solid and can be a powder. The samples can be conductive or insulating. Sample sizes can vary but can be no larger than 0.5" thick and modifications can be made to accommodate samples up to 4" wide for conductive samples. Insulating samples can be no larger than 2" and no thicker than 0.25". The instrument also has the ability to degas several samples in a separate chamber form the analyzer. The vacuum system is equipped with two turbo pumps and a cryogenic pump.

System Specifications

  • AlKα monochromatic x-ray source
  • Variable spot size
  • 145 mm OD, 88mm ID hemispherical analyzer
  • Take-off angle: 55 deg wrt vertical
  • X-ray to lens axis angle: 70 deg
  • Lens acceptance angle: 30 deg full angle
  • Power at the anode 15, 50, 100, 200 watts

Analysis Software

Casa XPS can be used for analysis. Only WWU personnel can access the software. You need to download the .zip and unpack it. Installation is not required.

XPS Instrument in Lab

Helpful Files

Equipment Hazards (32.88 KB)